Invention Grant
US09436082B2 Compositions comprising base-reactive component and processes for photolithography
有权
包含碱反应性组分的组合物和用于光刻的方法
- Patent Title: Compositions comprising base-reactive component and processes for photolithography
- Patent Title (中): 包含碱反应性组分的组合物和用于光刻的方法
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Application No.: US13341067Application Date: 2011-12-30
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Publication No.: US09436082B2Publication Date: 2016-09-06
- Inventor: Deyan Wang , Shintaro Yamada , Cong Liu , Mingqi Li , Joon-Seok Oh , Chunyi Wu , Doris Kang , Cheng-Bai Xu
- Applicant: Deyan Wang , Shintaro Yamada , Cong Liu , Mingqi Li , Joon-Seok Oh , Chunyi Wu , Doris Kang , Cheng-Bai Xu
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee: Rohm and Haas Electronics Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; G03F7/039 ; G03F7/11
Abstract:
New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.
Public/Granted literature
- US20120171626A1 COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY Public/Granted day:2012-07-05
Information query
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