Invention Grant
- Patent Title: Method of fabricating a pellicle frame
- Patent Title (中): 防护薄膜框架的制造方法
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Application No.: US13827542Application Date: 2013-03-14
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Publication No.: US09436077B2Publication Date: 2016-09-06
- Inventor: Jeong jin Kim , Bum hyun An , Chan uk Jeon , Han shin Lee , Jae hyuck Choi , Seung wan Kim , Ik jun Kim , Jang dong You
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , FINE SEMITECH CORP.
- Applicant Address: KR Suwon-si, Gyeonggi-do KR Hwaseong-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,FINE SEMITECH CORP.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,FINE SEMITECH CORP.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do KR Hwaseong-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2009-0086670 20090914
- Main IPC: C25D11/02
- IPC: C25D11/02 ; C25D11/04 ; G03F1/00 ; C25D11/06 ; C25D11/18 ; G03F1/64
Abstract:
A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
Public/Granted literature
- US20130202993A1 METHOD OF FABRICATING THE PELLICLE FRAME Public/Granted day:2013-08-08
Information query
