Invention Grant
- Patent Title: Position measuring apparatus, pattern transfer apparatus, and method for manufacturing a device
- Patent Title (中): 位置测量装置，图案转印装置以及装置的制造方法
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Application No.: US13863735Application Date: 2013-04-16
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Publication No.: US09435642B2Publication Date: 2016-09-06
- Inventor: Keiji Emoto , Naoki Maruyama
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2012-096941 20120420; JP2012-096942 20120420
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/27 ; G01B7/00 ; H01L21/67 ; H05K3/00 ; G03F7/00
Abstract:
A position measuring apparatus configured to measure a position of an measured object using a plate-like scale including a grating pattern, includes a supporting unit configured to be arranged between a structure and the scale and to support the scale, in which the supporting unit includes a spring element that reduces vibration transferred from the structure to the scale in a plate thickness direction.
Public/Granted literature
- US20130293889A1 POSITION MEASURING APPARATUS, PATTERN TRANSFER APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE Public/Granted day:2013-11-07
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