Invention Grant
- Patent Title: Radical inhibitor
- Patent Title (中): 自由基抑制剂
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Application No.: US14354379Application Date: 2012-09-27
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Publication No.: US09434880B2Publication Date: 2016-09-06
- Inventor: Yoshihiro Ishikawa , Haruki Eguchi
- Applicant: IHI Corporation , Yoshihiro Ishikawa
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: IHI CORPORATION,Yoshihiro Ishikawa
- Current Assignee: IHI CORPORATION,Yoshihiro Ishikawa
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Brundidge & Stranger, P.C.
- Priority: JP2011-236486 20111027
- International Application: PCT/JP2012/074938 WO 20120927
- International Announcement: WO2013/061724 WO 20130502
- Main IPC: C09K15/20
- IPC: C09K15/20 ; C07C225/14 ; C07C251/08 ; C07C251/10 ; C09K15/32 ; C07D211/58 ; C07D307/52 ; C07F15/02 ; A61K8/49 ; A61Q17/04 ; C07D307/58
Abstract:
A new radical inhibitor, a composition containing the new radical inhibitor, and a radical generation inhibition method using the new radical inhibitor are provided. A radical inhibitor according to the present invention contains a salen complex compound of a bivalent metal.
Public/Granted literature
- US20140302604A1 RADICAL INHIBITOR Public/Granted day:2014-10-09
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