Invention Grant
- Patent Title: Pattern inspection method, pattern formation control method, and pattern inspection apparatus
- Patent Title (中): 图案检查方法，图案形成控制方法和图案检查装置
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Application No.: US14283339Application Date: 2014-05-21
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Publication No.: US09433967B2Publication Date: 2016-09-06
- Inventor: Masafumi Asano
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- Priority: JP2014-030384 20140220
- Main IPC: B05C9/14
- IPC: B05C9/14 ; B05C21/00 ; G03F7/00 ; G02F1/01 ; C09K11/06 ; G01N21/64 ; G01N21/956 ; H01L21/66
Abstract:
According to one embodiment, in a pattern inspection method, a guide pattern is formed on a substrate. A block copolymer is applied on the guide pattern. Thereafter, the substrate is heated according to a predetermined heating condition to promote directed self assembly corresponding to a shape of the guide pattern with respect to the block copolymer. Further, the substrate is observed by a fluorescence microscope during heating or after heating the substrate.
Public/Granted literature
- US20150235911A1 PATTERN INSPECTION METHOD, PATTERN FORMATION CONTROL METHOD, AND PATTERN INSPECTION APPARATUS Public/Granted day:2015-08-20
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