Invention Grant
- Patent Title: Radiation source, lithographic apparatus and device manufacturing method
- Patent Title (中): 辐射源，光刻设备和器件制造方法
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Application No.: US12540548Application Date: 2009-08-13
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Publication No.: US09414477B2Publication Date: 2016-08-09
- Inventor: Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
- Applicant: Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20
Abstract:
A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.
Public/Granted literature
- US20100044591A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-02-25
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