Invention Grant
- Patent Title: Deposition of smooth metal nitride films
- Patent Title (中): 沉积光滑的金属氮化物膜
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Application No.: US13802157Application Date: 2013-03-13
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Publication No.: US09412602B2Publication Date: 2016-08-09
- Inventor: Tom E. Blomberg , Jaakko Anttila
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: H01L21/285
- IPC: H01L21/285 ; H01L21/768 ; C23C16/34 ; C23C16/455

Abstract:
In one aspect, methods of forming smooth ternary metal nitride films, such as TixWyNz films, are provided. In some embodiments, the films are formed by an ALD process comprising multiple super-cycles, each super-cycle comprising two deposition sub-cycles. In one sub-cycle a metal nitride, such as TiN is deposited, for example from TiCl4 and NH3, and in the other sub-cycle an elemental metal, such as W, is deposited, for example from WF6 and Si2H6. The ratio of the numbers of each sub-cycle carried out within each super-cycle can be selected to achieve a film of the desired composition and having desired properties.
Public/Granted literature
- US20140273452A1 DEPOSITION OF SMOOTH METAL NITRIDE FILMS Public/Granted day:2014-09-18
Information query
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