Invention Grant
- Patent Title: Remote arc discharge plasma assisted processes
- Patent Title (中): 远程电弧放电等离子体辅助工艺
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Application No.: US13617005Application Date: 2012-09-14
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Publication No.: US09412569B2Publication Date: 2016-08-09
- Inventor: Vladimir Gorokhovsky , William Grant , Edward W. Taylor , David Humenik , Klaus Brondum
- Applicant: Vladimir Gorokhovsky , William Grant , Edward W. Taylor , David Humenik , Klaus Brondum
- Applicant Address: US CO Longmont
- Assignee: VAPOR TECHNOLOGIES, INC.
- Current Assignee: VAPOR TECHNOLOGIES, INC.
- Current Assignee Address: US CO Longmont
- Agency: Brooks Kushman P.C.
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/32 ; C23C14/35 ; H01J37/32 ; H01J49/12 ; C23C14/34 ; C23C14/06 ; C23C14/22

Abstract:
A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.
Public/Granted literature
- US20140076718A1 Remote Arc Discharge Plasma Assisted Processes Public/Granted day:2014-03-20
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