Invention Grant
- Patent Title: Semiconductor wafer and method of fabricating an IC die
- Patent Title (中): 半导体晶片及其制造方法
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Application No.: US14574597Application Date: 2014-12-18
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Publication No.: US09406347B2Publication Date: 2016-08-02
- Inventor: Robert F. Moran , Derek Beattie , Mark Maiolani
- Applicant: Robert F. Moran , Derek Beattie , Mark Maiolani
- Applicant Address: US TX Austin
- Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee Address: US TX Austin
- Main IPC: H01L23/544
- IPC: H01L23/544 ; G11C5/02 ; G11C5/06 ; G11C8/10 ; G11C7/10 ; H01L21/82 ; H01L27/02 ; H01L23/528

Abstract:
There is provided a semiconductor wafer comprising a plurality of replicated IC modules. Each replicated IC module is capable of forming an individual IC die. The semiconductor wafer further comprises inter-module cross-wafer electrical connections, and the replicated IC modules are further arranged to be cut into IC dies comprising multiple replicated IC modules.There is further provided a method of fabricating an IC die. The method comprises fabricating such a semiconductor wafer, determining a required configuration of replicated IC modules, identifying inter-module boundaries along which to cut the semiconductor wafer to achieve the required configuration of replicated IC modules, and cutting the semiconductor wafer along the identified inter-module boundaries to produce at least one IC die comprising the required configuration of replicated IC modules.
Public/Granted literature
- US20160180891A1 SEMICONDUCTOR WAFER AND METHOD OF FABRICATING AN IC DIE Public/Granted day:2016-06-23
Information query
IPC分类: