Invention Grant
- Patent Title: Integrated device comprising coaxial interconnect
- Patent Title (中): 包括同轴互连的集成装置
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Application No.: US14329646Application Date: 2014-07-11
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Publication No.: US09385077B2Publication Date: 2016-07-05
- Inventor: Dong Wook Kim , Young Kyu Song , Kyu-Pyung Hwang , Hong Bok We
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Loza & Loza, LLP
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L23/498 ; H01L21/48 ; H05K1/02 ; H05K3/28 ; H05K3/46

Abstract:
Some novel features pertain to an integrated device that includes a substrate, a first interconnect coupled to the substrate, and a second interconnect surrounding the first interconnect. The second interconnect may be configured to provide an electrical connection to ground. In some implementations, the second interconnect includes a plate. In some implementations, the integrated device also includes a dielectric material between the first interconnect and the second interconnect. In some implementations, the integrated device also includes a mold surrounding the second interconnect. In some implementations, the first interconnect is configured to conduct a power signal in a first direction. In some implementations, the second interconnect is configured to conduct a grounding signal in a second direction. In some implementations, the second direction is different from the first direction. In some implementations, the integrated device may be a package-on-package (PoP) device.
Public/Granted literature
- US20160013125A1 INTEGRATED DEVICE COMPRISING COAXIAL INTERCONNECT Public/Granted day:2016-01-14
Information query
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