Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US14412847Application Date: 2012-07-11
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Publication No.: US09385007B2Publication Date: 2016-07-05
- Inventor: Mamoru Terai , Shiori Idaka , Yoshiyuki Nakaki , Yoshiyuki Suehiro
- Applicant: Mamoru Terai , Shiori Idaka , Yoshiyuki Nakaki , Yoshiyuki Suehiro
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P
- International Application: PCT/JP2012/004472 WO 20120711
- International Announcement: WO2014/009997 WO 20140116
- Main IPC: H01L21/56
- IPC: H01L21/56 ; H01L23/31 ; H01L29/417 ; H01L21/78 ; H01L23/433 ; H01L23/00 ; H01L23/495

Abstract:
A plurality of semiconductor elements for power control are formed on a semiconductor substrate. A stress relaxation resin layer covering a crossing region where band-shaped dicing areas dividing the semiconductor elements adjacent to each other cross is formed. The crossing region is diced to cut the stress relaxation resin layer to obtain the separate semiconductor elements. Accordingly, even with semiconductor elements produced with a compound semiconductor substrate of SiC or the like, a semiconductor device having high adhesive strength with a sealing resin and being less likely to cause cracking or peeling of the sealing resin due to thermal stress during an operation can be obtained.
Public/Granted literature
- US20150162219A1 Semiconductor Device and Method of Manufacturing the Same Public/Granted day:2015-06-11
Information query
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