Invention Grant
US09382642B2 Reaction chamber of an epitaxial reactor and reactor that uses said chamber
有权
使用所述室的外延反应器和反应器的反应室
- Patent Title: Reaction chamber of an epitaxial reactor and reactor that uses said chamber
- Patent Title (中): 使用所述室的外延反应器和反应器的反应室
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Application No.: US13259818Application Date: 2010-04-16
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Publication No.: US09382642B2Publication Date: 2016-07-05
- Inventor: Srinivas Yarlagadda , Natale Speciale , Franco Preti , Mario Preti
- Applicant: Srinivas Yarlagadda , Natale Speciale , Franco Preti , Mario Preti
- Applicant Address: IT Baranzate
- Assignee: LPE S.P.A.
- Current Assignee: LPE S.P.A.
- Current Assignee Address: IT Baranzate
- Agency: Brannen Law Office, LLC
- Priority: ITMI2009A0629 20090417
- International Application: PCT/IB2010/051666 WO 20100416
- International Announcement: WO2010/119430 WO 20101021
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C30B25/08 ; C23C16/46 ; C30B25/10 ; C30B29/06 ; C30B29/08 ; C30B29/36 ; C30B29/40
Abstract:
The present invention relates to a reaction chamber of an epitaxial reactor that essentially consists of a quartz piece; the quartz piece comprises a quartz piece portion (1) having an internal cavity (2) defined by walls (1A, 1B, 1C, 1D); the cavity (2) comprises a reaction and deposition zone (3) of the epitaxial reactor; the zone (3) is adapted to house a susceptor (4) to be heated therein; the reaction chamber also comprises a quartz component (5) arranged close to said walls (1A, 1B, 1C, 1D) in such a manner as to form a counterwall and to be a wall of said zone (3).
Public/Granted literature
- US20120027646A1 Reaction Chamber of an Epitaxial Reactor and Reactor That Uses Said Chamber Public/Granted day:2012-02-02
Information query
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