Invention Grant
- Patent Title: Silicon carbide powder and method for producing same
- Patent Title (中): 碳化硅粉末及其制造方法
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Application No.: US14239555Application Date: 2012-08-23
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Publication No.: US09382121B2Publication Date: 2016-07-05
- Inventor: Kenta Masuda , Kouki Ichitsubo , Kohei Kawano , Masakazu Suzuki , Jun Kumasaka , Hideaki Tanaka
- Applicant: Kenta Masuda , Kouki Ichitsubo , Kohei Kawano , Masakazu Suzuki , Jun Kumasaka , Hideaki Tanaka
- Applicant Address: JP Tokyo
- Assignee: TAIHEIYO CEMENT CORPORATION
- Current Assignee: TAIHEIYO CEMENT CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2011-182933 20110824
- International Application: PCT/JP2012/071270 WO 20120823
- International Announcement: WO2013/027790 WO 20130228
- Main IPC: C04B2/00
- IPC: C04B2/00 ; C04B7/00 ; C04B14/00 ; C04B22/00 ; C04B26/00 ; C04B33/00 ; C04B103/00 ; B82Y30/00 ; C01B31/36 ; C04B35/573 ; C04B35/626

Abstract:
A high-purity silicon carbide powder and its production method enable mass production of the high-purity silicon carbide powder at low cost in a safe manner. The content of impurities in the silicon carbide powder is 500 ppm or less. The silicon carbide powder can be obtained by heating a raw material for silicon carbide production in an Acheson furnace using a heat generator. The raw material for silicon carbide production is prepared by mixing a siliceous raw material and a carbonaceous raw material. The raw material for silicon carbide production contains the siliceous raw material and the carbonaceous raw material at a mixture mole ratio (C/SiO2) of 2.5 to 4.0 and has a content of impurities of 120 ppm or less.
Public/Granted literature
- US20140301933A1 SILICON CARBIDE POWDER AND METHOD FOR PRODUCING SAME Public/Granted day:2014-10-09
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