Invention Grant
- Patent Title: Field effect transistor, termination structure and associated method for manufacturing
- Patent Title (中): 场效应晶体管,端接结构及相关制造方法
-
Application No.: US14290804Application Date: 2014-05-29
-
Publication No.: US09362351B2Publication Date: 2016-06-07
- Inventor: Rongyao Ma , Tiesheng Li , Huaifeng Wang
- Applicant: Chengdu Monolithic Power Systems Co., Ltd.
- Applicant Address: CN Chengdu
- Assignee: Chengdu Monolithic Power Systems Co., Ltd.
- Current Assignee: Chengdu Monolithic Power Systems Co., Ltd.
- Current Assignee Address: CN Chengdu
- Agency: Perkins Coie LLP
- Priority: CN201310205319 20130529
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/423 ; H01L29/40 ; H01L29/66 ; H01L29/78 ; H01L29/417

Abstract:
A field effect transistor (“FET”), a termination structure and associated method for manufacturing. The FET has a plurality of active transistor cells and a termination structure. The termination structure for the FET includes a plurality of termination cells arranged substantially in parallel from an inner side toward an outer side of a termination area of the FET. Each of the termination cells comprises a termination trench lined with a termination insulation layer and filled with a termination conduction layer. The innermost termination cell is electrically coupled to gate regions of the active transistor cells while the rest of the termination cells are electrically floating.
Public/Granted literature
- US20140353748A1 FIELD EFFECT TRANSISTOR, TERMINATION STRUCTURE AND ASSOCIATED METHOD FOR MANUFACTURING Public/Granted day:2014-12-04
Information query
IPC分类: