Invention Grant
- Patent Title: Integrated circuit assembly with cushion polymer layer
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Application No.: US14828986Application Date: 2015-08-18
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Publication No.: US09362223B2Publication Date: 2016-06-07
- Inventor: Paul S. Andry , Sarah H. Knickerbocker , Ron R. Legario , Cornelia K. Tsang , Melvin P. Zussman
- Applicant: International Business Machines Corporation , Hitachi Chemical DuPont Microsystems, L.L.C.
- Applicant Address: US NY Armonk US NJ Parlin
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION,HITACHI CHEMICIAL DUPONT MICROSYSTEMS, L.L.C.
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION,HITACHI CHEMICIAL DUPONT MICROSYSTEMS, L.L.C.
- Current Assignee Address: US NY Armonk US NJ Parlin
- Agency: Cantor Colburn LLP
- Agent Steven Meyers
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L23/532 ; H01L21/768 ; H01L21/3105 ; H01L21/02 ; H01L23/528 ; H01L23/48

Abstract:
A method of forming an integrated circuit assembly includes forming an insulator layer on a preliminary semiconductor assembly. The preliminary semiconductor assembly includes a semiconductor substrate having a first side and a second side opposite the first side, a semiconductor circuitry layer formed on the first side of the semiconductor substrate, and a conductive via extending through the semiconductor substrate from the semiconductor circuitry layer to the second side. The insulator is formed on the second side and an end of the conductive via. The method includes forming a polymer layer on the insulator layer, removing a quantity of the polymer layer sufficient to expose the end of the conductive via through the insulator layer, and forming a conductive contact on the polymer layer and the end of the conductive via.
Public/Granted literature
- US20150357283A1 INTEGRATED CIRCUIT ASSEMBLY WITH CUSHION POLYMER LAYER Public/Granted day:2015-12-10
Information query
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