A method for manufacturing a lead frame structure for semiconductor packaging. The method includes providing a metal substrate having a top surface and a back surface, forming a first photoresist film on the top surface of the metal substrate, forming a top surface etching pattern in the first photoresist film using photolithography, forming a second photoresist film on the back surface of the metal substrate, forming a back surface etching pattern in the second photoresist film using photolithography, performing an etching process on the top surface and the back surface of the metal substrate, removing the first photoresist film and the second photoresist film, placing the etched metal substrate in a mold, encapsulating the etched metal substrate using the mold; and performing a plating process on the encapsulated metal substrate.