Invention Grant
- Patent Title: Electro-optical element for multiple beam alignment
- Patent Title (中): 用于多光束对准的电光元件
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Application No.: US13458936Application Date: 2012-04-27
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Publication No.: US09362084B2Publication Date: 2016-06-07
- Inventor: Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
- Applicant: Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Priority: NL2007392 20110912
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/317

Abstract:
The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
Public/Granted literature
- US20120273691A1 CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE Public/Granted day:2012-11-01
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