Invention Grant
US09358575B2 Method for depositing particles onto a substrate, including a step of structuring a particle film on a liquid conveyor
有权
将颗粒沉积到基底上的方法,包括在液体输送机上构造颗粒膜的步骤
- Patent Title: Method for depositing particles onto a substrate, including a step of structuring a particle film on a liquid conveyor
- Patent Title (中): 将颗粒沉积到基底上的方法,包括在液体输送机上构造颗粒膜的步骤
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Application No.: US14375994Application Date: 2013-02-08
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Publication No.: US09358575B2Publication Date: 2016-06-07
- Inventor: Olivier Dellea , Philippe Coronel , Simon Frederic Desage , Pascal Fugier
- Applicant: Commissariat a l'energie atomique et aux ene alt
- Applicant Address: FR Paris
- Assignee: Commissariat à l'énergie atomique et aux énergies alternatives
- Current Assignee: Commissariat à l'énergie atomique et aux énergies alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1251255 20120210
- International Application: PCT/EP2013/052502 WO 20130208
- International Announcement: WO2013/117679 WO 20130815
- Main IPC: B05D5/00
- IPC: B05D5/00 ; B05D1/20 ; B82Y30/00 ; B05D1/26 ; H01L21/02 ; H01L31/18 ; H01L51/00

Abstract:
A method for depositing particles on a substrate, or a running substrate, including: (a) producing at least one first compact film of particles floating on a carrier liquid provided in a transfer area having an outlet of particles arranged facing the substrate; (b) producing at least one pattern by depositing a substance on the first film in the transfer area, along a contour of the pattern, the substance maintaining the particles of the film together in contact with the substance; (c) removing at least one portion of the particles of the first film located interiorly relatively to the contour, or exteriorly relatively to the contour; and then (d) transferring patterns onto the substrate through the outlet of particles.
Public/Granted literature
Information query