Invention Grant
- Patent Title: Interposer and method for manufacturing same
- Patent Title (中): 插件及其制造方法
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Application No.: US14150723Application Date: 2014-01-08
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Publication No.: US09332656B2Publication Date: 2016-05-03
- Inventor: Taekoo Lee
- Applicant: Zhen Ding Technology Co., Ltd.
- Applicant Address: TW Tayuan, Taoyuan
- Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee Address: TW Tayuan, Taoyuan
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN2013105846534 20131120
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H05K3/42 ; H05K1/03 ; H05K3/00

Abstract:
An interposer includes an insulating substrate, a photosensitive dielectric film, a conductive layer, and a conductive via. The insulating substrate includes a bottom surface and a top surface, and defines a receiving through hole extending through the bottom surface and the top surface. The photosensitive dielectric film is mounted on the bottom surface. The photosensitive dielectric film defines a through hole spatially corresponding to and communicating with the receiving through hole. The conductive layer is mounted on an end of the photosensitive dielectric film away from the insulating substrate. The conductive layer covers an end of the through hole. The conductive via is received in the receiving through hole and the through hole. The conductive via contacts and electrically connects to the conductive layer.
Public/Granted literature
- US20150136457A1 INTERPOSER AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-05-21
Information query
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