Invention Grant
- Patent Title: Manufacture of coated copper pillars
- Patent Title (中): 镀铜铜柱的制造
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Application No.: US14429364Application Date: 2013-07-19
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Publication No.: US09331040B2Publication Date: 2016-05-03
- Inventor: Thomas Beck , Gerhard Steinberger , Andreas Walter
- Applicant: Atotech Deutschland GmbH
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GmbH
- Current Assignee: Atotech Deutschland GmbH
- Current Assignee Address: DE Berlin
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: EP12185004 20120919
- International Application: PCT/EP2013/065296 WO 20130719
- International Announcement: WO2014/044435 WO 20140327
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L23/00

Abstract:
The present invention relates to a method for forming a copper pillar on a semiconducting substrate, the copper pillar having an underbump metallization area comprising a metal less noble than copper and optionally a solder bump on the top portion, and having a layer of a second metal selected from tin, tin alloys, silver, and silver alloys deposited onto the side walls of said copper pillar. A layer of a first metal which is more noble than copper is deposited onto the entire outer surface of the copper pillar prior to deposition of the second metal layer. The layer of a second metal then has at least a reduced number of undesired pin-holes and serves as a protection layer for the underlying copper pillar.
Public/Granted literature
- US20150279797A1 MANUFACTURE OF COATED COPPER PILLARS Public/Granted day:2015-10-01
Information query
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