Invention Grant
- Patent Title: Fabrication method of semiconductor memory device
- Patent Title (中): 半导体存储器件的制造方法
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Application No.: US14668330Application Date: 2015-03-25
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Publication No.: US09305775B2Publication Date: 2016-04-05
- Inventor: Young Ho Lee , Keum Bum Lee , Min Yong Lee , Hyung Suk Lee , Seung Beom Baek
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2012-0093197 20120824
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L21/02 ; H01L29/36 ; H01L29/66 ; H01L29/868 ; H01L27/24 ; H01L21/22 ; H01L29/161

Abstract:
An access device having a reduced height and capable of suppressing leakage current, a method of fabricating the same, and a semiconductor memory device including the same, are provided. The access device may include a stacked structure including a first-type semiconductor layer having a first dopant, a second-type semiconductor layer having a second dopant, and a third-type semiconductor layer. A first counter-doping layer, having a counter-dopant to the first dopant, is interposed between the first-type semiconductor layer and the third-type semiconductor layer. A second counter-doping layer, having a counter-dopant to the second dopant, is interposed between the third-type semiconductor layer and the second-type semiconductor layer.
Public/Granted literature
- US20150200088A1 ACCESS DEVICE, FABRICATION METHOD THEREOF, AND SEMICONDUCTOR MEMORY DEVICE HAVING THE SAME Public/Granted day:2015-07-16
Information query
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