Invention Grant
US09275884B2 Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers
有权
用于抑制衬底处理器真空室中的氧化物生长的系统和方法
- Patent Title: Systems and methods for inhibiting oxide growth in substrate handler vacuum chambers
- Patent Title (中): 用于抑制衬底处理器真空室中的氧化物生长的系统和方法
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Application No.: US13419625Application Date: 2012-03-14
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Publication No.: US09275884B2Publication Date: 2016-03-01
- Inventor: Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
- Applicant: Mukul Khosla , Ronald Powell , Arun Keshavamurthy , Richard Blank
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/677
- IPC: H01L21/677 ; C23C14/56
Abstract:
A substrate handling robot includes an arm section and a wrist portion connected to the arm section. An end effector is connected to the wrist portion and is configured to support a substrate. A housing is arranged adjacent to the end effector and includes a gas outlet that directs gas onto an exposed surface of the substrate during transport.
Public/Granted literature
- US20120251271A1 SYSTEMS AND METHODS FOR INHIBITING OXIDE GROWTH IN SUBSTRATE HANDLER VACUUM CHAMBERS Public/Granted day:2012-10-04
Information query
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