Invention Grant
US09275881B2 Liquid processing apparatus, liquid processing method, and storage medium
有权
液体处理装置，液体处理方法和存储介质
- Patent Title: Liquid processing apparatus, liquid processing method, and storage medium
- Patent Title (中): 液体处理装置，液体处理方法和存储介质
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Application No.: US13659996Application Date: 2012-10-25
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Publication No.: US09275881B2Publication Date: 2016-03-01
- Inventor: Shuichi Nagamine , Yusuke Hashimoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2011-236354 20111027
- Main IPC: B08B11/00
- IPC: B08B11/00 ; H01L21/67 ; H01L21/02
Abstract:
A liquid processing apparatus of the present disclosure includes a rotatable substrate holder that holds a wafer from above, and a top plate nozzle that supplies at least rinse liquid to the wafer and is provided in the rotation center of the substrate holder. The top plate nozzle is movably configured with the substrate holder in the top-bottom direction, and the rinse liquid is supplied to the wafer from the top plate nozzle while the top plate nozzle is spaced from the substrate holder. When the top plate nozzle approaches to the substrate holder, the rinse liquid is supplied to the lower surface of the substrate holder from the top plate nozzle to clean the lower surface of the substrate holder.
Public/Granted literature
- US20130104940A1 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM Public/Granted day:2013-05-02
Information query
IPC分类:
