Invention Grant
- Patent Title: Method for forming stair-step structures
- Patent Title (中): 形成阶梯结构的方法
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Application No.: US14581673Application Date: 2014-12-23
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Publication No.: US09275872B2Publication Date: 2016-03-01
- Inventor: Qian Fu , Hyun-Yong Yu
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: H01L21/312
- IPC: H01L21/312 ; H01L21/308 ; H01L21/3213 ; H01L27/115 ; H01L21/3065 ; H01L21/67 ; H01L21/02 ; H01L21/311
Abstract:
A method for forming a stair-step structure in a substrate is provided. An organic mask is formed over the substrate. A hardmask with a top layer and sidewall layer is formed over the organic mask. The sidewall layer of the hard mask is removed while leaving the top layer of the hardmask. The organic mask is trimmed. The substrate is etched. The forming the hardmask, removing the sidewall layer, trimming the organic mask, and etching the substrate are repeated a plurality of times.
Public/Granted literature
- US20150118853A1 METHOD FOR FORMING STAIR-STEP STRUCTURES Public/Granted day:2015-04-30
Information query
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