Invention Grant
- Patent Title: Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same
- Patent Title (中): 反射型空白掩模，其制造方法以及使用其形成反射型光掩模的方法
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Application No.: US14258473Application Date: 2014-04-22
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Publication No.: US09274411B2Publication Date: 2016-03-01
- Inventor: Yong Dae Kim , Byung Ho Nam
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: William Park & Associates Ltd.
- Priority: KR10-2012-0060242 20120605
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/22 ; G03F1/38
Abstract:
Reflection type blank masks are provided. The blank mask includes a substrate having a recessed pattern with a predetermined depth, a reflection layer substantially on the substrate, an absorption layer substantially on the reflection layer, and a resist layer substantially on the absorption layer, wherein the resist layer has a recessed part that is formed by transference of the profile from the recessed pattern.
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