Invention Grant
- Patent Title: Anisotropic conductive material and method for manufacturing same
- Patent Title (中): 各向异性导电材料及其制造方法
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Application No.: US13702485Application Date: 2011-11-30
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Publication No.: US09253911B2Publication Date: 2016-02-02
- Inventor: Reiji Tsukao , Tomoyuki Ishimatsu , Hiroki Ozeki
- Applicant: Reiji Tsukao , Tomoyuki Ishimatsu , Hiroki Ozeki
- Applicant Address: JP Tokyo
- Assignee: DEXERIALS CORPORATION
- Current Assignee: DEXERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-269422 20101202
- International Application: PCT/JP2011/077689 WO 20111130
- International Announcement: WO2012/074015 WO 20120607
- Main IPC: H05K7/04
- IPC: H05K7/04 ; H01R43/00 ; H01B1/10 ; H01B1/08 ; H01B1/20 ; H01L23/00 ; H01R4/04 ; H05K3/32

Abstract:
The present invention provides an anisotropic conductive material in which lower continuity resistance and higher adhesive strength are obtained, and a method for manufacturing the same. When a glass substrate and a metal wiring material are thermally compressed and bonded, in an interface between the glass substrate and an anisotropic conductive material, Si on a surface of the glass substrate reacts on an alkoxyl group (OR) at an end of disulfide silane modified by hydrophobic silica, and chemically binds thereto. Furthermore, at an interface between the metal wiring material and the anisotropic conductive material, a part of S—S bonds (disulfide bonds) in disulfide silane dissociates due to the heat at the time of thermocompression bonding, and the dissociated sulfide silane chemically binds to metal Me.
Public/Granted literature
- US20130135838A1 ANISOTROPIC CONDUCTIVE MATERIAL AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-05-30
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