Invention Grant
- Patent Title: Optoelectronic device and the manufacturing method thereof
- Patent Title (中): 光电子器件及其制造方法
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Application No.: US13693531Application Date: 2012-12-04
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Publication No.: US09252297B2Publication Date: 2016-02-02
- Inventor: Yi-Hung Lin , Cheng-Hong Chen
- Applicant: Epistar Corporation
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L27/15
- IPC: H01L27/15 ; H01L31/0216 ; H01L31/0224 ; H01L31/0735 ; H01L31/18

Abstract:
An optoelectronic device comprises an optoelectronic semiconductor stack layer; a conductive layer on the optoelectronic semiconductor stack layer, the conductive layer comprising a top surface, a bottom surface opposite to the top surface, and a side surface; a first barrier layer covering the top surface; a second barrier layer covering the bottom surface; and a first metal oxide layer, wherein the first metal oxide layer covers the side surface, the first barrier layer, and the second barrier layer.
Public/Granted literature
- US20140150858A1 OPTOELECTRONIC DEVICE AND THE MANUFACTURING METHOD THEREOF Public/Granted day:2014-06-05
Information query
IPC分类: