Invention Grant
US09252094B2 Semiconductor device and method of forming an interconnect structure with conductive material recessed within conductive ring over surface of conductive pillar 有权
在导电柱的表面上形成导电环内的导电材料形成互连结构的半导体器件和方法

Semiconductor device and method of forming an interconnect structure with conductive material recessed within conductive ring over surface of conductive pillar
Abstract:
A semiconductor device has a semiconductor die with a first conductive layer formed over an active surface of the semiconductor die. An insulation layer is formed over the active surface of the semiconductor die. A second conductive layer is conformally applied over the insulating layer and first conductive layer. Conductive pillars are formed over the first conductive layer. Conductive rings are formed around a perimeter of the conductive pillars. A conductive material is deposited over the surface of the conductive pillars within the conductive rings. A substrate has a third conductive layer formed over a surface of the substrate. The semiconductor die is mounted to a substrate with the third conductive layer electrically connected to the conductive material within the conductive rings. The conductive rings inhibit outward flow of the conductive material from under the conductive pillars to prevent electrical bridging between adjacent conductive pillars.
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