Invention Grant
- Patent Title: Overlay/alignment measurement method and overlay/alignment measurement apparatus
- Patent Title (中): 覆盖/对准测量方法和覆盖/对准测量装置
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Application No.: US13051460Application Date: 2011-03-18
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Publication No.: US09250542B2Publication Date: 2016-02-02
- Inventor: Kazutaka Ishigo
- Applicant: Kazutaka Ishigo
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2010-212542 20100922
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F7/20 ; G03F9/00

Abstract:
According to one embodiment, a method includes preliminarily measuring the amount of overlay or alignment shift of the mark for overlay or alignment measurement while sequentially shifting a position of a measurement area relative to the mark for overlay or alignment measurement so as to position the mark for overlay or alignment measurement on each of a plurality of partial areas. The measurement area corresponds to a field angle of the optical measurement system, and an inside of the measurement area is two-dimensionally divided into the partial areas. The method includes calculating a tool-induced shift regarding a characteristic deviation of the optical measurement system for each of the plurality of partial areas based on a preliminarily measured result of the amount of overlay or alignment shift. The method includes determining a partial area to be used from among the plurality of partial areas on the basis of the tool-induced shift calculated for each of the plurality of partial areas.
Public/Granted literature
- US20120069337A1 OVERLAY/ALIGNMENT MEASUREMENT METHOD AND OVERLAY/ALIGNMENT MEASUREMENT APPARATUS Public/Granted day:2012-03-22
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