Invention Grant
US09250535B2 Source, target and mask optimization by incorporating countour based assessments and integration over process variations
有权
来源，目标和面具优化，包括基于countour的评估和整合过程变化
- Patent Title: Source, target and mask optimization by incorporating countour based assessments and integration over process variations
- Patent Title (中): 来源，目标和面具优化，包括基于countour的评估和整合过程变化
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Application No.: US13837435Application Date: 2013-03-15
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Publication No.: US09250535B2Publication Date: 2016-02-02
- Inventor: Tadanobu Inoue , David O. Melville , Alan E. Rosenbluth , Masaharu Sakamoto , Kehan Tian
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/32 ; G03F7/20
Abstract:
Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output.
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