Invention Grant
- Patent Title: Microscope illumination system, microscope and oblique incident illumination method
- Patent Title (中): 显微镜照明系统,显微镜和斜入射照明法
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Application No.: US13270267Application Date: 2011-10-11
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Publication No.: US09250432B2Publication Date: 2016-02-02
- Inventor: Albrecht Weiss , Arnold Mueller-Rentz , Klaus-Peter Schwaab , Stefan Motyka
- Applicant: Albrecht Weiss , Arnold Mueller-Rentz , Klaus-Peter Schwaab , Stefan Motyka
- Applicant Address: DE Wetzlar
- Assignee: LEICA MICROSYSTEMS CMS GMBH
- Current Assignee: LEICA MICROSYSTEMS CMS GMBH
- Current Assignee Address: DE Wetzlar
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102010042351 20101012
- Main IPC: G02B21/08
- IPC: G02B21/08 ; G02B21/16

Abstract:
A microscope illumination system includes a first light source configured to provide light along an optical axis and an aperture device including an aperture wheel that is rotatable about an axis of rotation. The aperture wheel includes a plurality of apertures of varying size disposed circumferentially on the aperture wheel. The aperture wheel is rotatable so as to dispose each of the apertures in a position that is centered on the optical axis so as to generate an illumination beam path that extends in a centered relationship with respect to the optical axis, and so as to dispose each of the apertures in a position that is off-center from the optical axis and that is within a defined region around the optical axis so as to generate an illumination beam path that extends off-center from the optical axis for oblique incident illumination.
Public/Granted literature
- US20120086795A1 MICROSCOPE ILLUMINATION SYSTEM, MICROSCOPE AND OBLIQUE INCIDENT ILLUMINATION METHOD Public/Granted day:2012-04-12
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