Invention Grant
- Patent Title: Schottky diode with leakage current control structures
- Patent Title (中): 具有漏电流控制结构的肖特基二极管
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Application No.: US13537299Application Date: 2012-06-29
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Publication No.: US09231120B2Publication Date: 2016-01-05
- Inventor: Weize Chen , Xin Lin , Patrice M. Parris
- Applicant: Weize Chen , Xin Lin , Patrice M. Parris
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agent Charlene R. Jacobsen
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/417 ; H01L29/66 ; H01L29/06

Abstract:
A Schottky diode includes a device structure having a central portion and a plurality of fingers. Distal portions of the fingers overlie leakage current control (LCC) regions. An LCC region is relatively narrow and deep, terminating in proximity to a buried layer of like polarity. Under reverse bias, depletion regions forming in an active region lying between the buried layer and the LCC regions occupy the entire extent of the active region and thereby provide a carrier depleted wall. An analogous depletion region occurs in the active region residing between any pair of adjacent fingers. If the fingers include latitudinal oriented fingers and longitudinal oriented fingers, depletion region blockades in three different orthogonal orientations may occur. The formation of the LCC regions may include the use of a high dose, low energy phosphorous implant using an LCC implant mask and the isolation structures as an additional hard mask.
Public/Granted literature
- US20140001594A1 SCHOTTKY DIODE WITH LEAKAGE CURRENT CONTROL STRUCTURES Public/Granted day:2014-01-02
Information query
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