Invention Grant
US09230612B2 Semiconductor devices and methods of fabricating the same 有权
半导体器件及其制造方法

Semiconductor devices and methods of fabricating the same
Abstract:
A semiconductor device includes a plurality of word lines; a plurality of bit lines; and a plurality of bit line node contacts. The plurality of word lines extend in a first direction in or on a substrate. The plurality of bit lines crosses over the plurality of word lines. Each of the plurality of bit line node contacts connects a corresponding bit line to the substrate, and each of the plurality of bit line node contacts has a width substantially equal to a width of the corresponding bit line.
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