Invention Grant
- Patent Title: Conductive film having oxide layer and method of manufacturing the same
- Patent Title (中): 具有氧化物层的导电膜及其制造方法
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Application No.: US13894928Application Date: 2013-05-15
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Publication No.: US09101059B2Publication Date: 2015-08-04
- Inventor: Ji Hee Kim , Jung Bum Kim , Jung Hyoung Lee , Min Choon Park
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, LLP
- Priority: KR10-2010-0114642 20101117
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K3/10 ; H01L31/0224 ; H01L31/0392 ; H01L31/18

Abstract:
Provided are a conductive film and a method of manufacturing the same. The conductive film includes a substrate, a first conductive layer formed on the substrate, and a patterned second conductive layer formed on the first conductive layer. Here, oxide layers are formed on top and side surfaces of the second conductive layer. The conductive film may prevent defects of the conductive layer caused by rapid oxidation or damage to the substrate, and increase emission uniformity.
Public/Granted literature
- US20130248227A1 CONDUCTIVE FILM HAVING OXIDE LAYER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-09-26
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