Invention Grant
- Patent Title: Control of uniformity in a surface wave plasma source
- Patent Title (中): 控制表面波等离子体源的均匀性
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Application No.: US13720485Application Date: 2012-12-19
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Publication No.: US09101042B2Publication Date: 2015-08-04
- Inventor: Sergey A. Voronin , Alok Ranjan
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evan, LLP
- Main IPC: H01Q1/26
- IPC: H01Q1/26 ; H05H1/46

Abstract:
A surface wave plasma source (SWPS) is disclosed, having an electromagnetic (EM) wave launcher including a slot antenna configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the SWPS adjacent the plasma. The SWPS also includes a dielectric window positioned below the slot antenna, having a lower surface and the plasma surface. The SWPS further includes an attenuation assembly disposed between the slot antenna and the plasma surface. The attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in the slot antenna, and is configured to receive a first flow of a first fluid at a first fluid temperature. The SWPS finally includes a power coupling system coupled to the EM wave launcher and configured to provide EM energy to the EM wave launcher for forming the plasma.
Public/Granted literature
- US20140028184A1 CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE Public/Granted day:2014-01-30
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