Invention Grant
- Patent Title: Light-emitting device manufacturing method
- Patent Title (中): 发光元件的制造方法
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Application No.: US13371670Application Date: 2012-02-13
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Publication No.: US09076923B2Publication Date: 2015-07-07
- Inventor: Cheng-Hsien Li , Chi-Hao Huang , Hsin-Hsiung Huang
- Applicant: Cheng-Hsien Li , Chi-Hao Huang , Hsin-Hsiung Huang
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L33/20
- IPC: H01L33/20 ; H01L33/44 ; H01L33/00 ; H01L33/40

Abstract:
A method for manufacturing a light-emitting device comprising the steps of: providing a first substrate, a chip area, and a street area; forming a light-emitting structure on the first substrate; forming a conductive structure between the first substrate and the light-emitting structure; removing a part of the light-emitting structure in the street area to expose a sidewall of the light-emitting structure in the chip area; forming a first passivation layer on the light-emitting structure in the chip area; forming a second passivation layer on the conductive structure in the street area, on the sidewalls of the light-emitting structure, and on the sidewalls of the first passivation layer; forming a through-hole in the first passivation layer, and forming an electrode in the through-hole.
Public/Granted literature
- US20130210178A1 LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-08-15
Information query
IPC分类: