Invention Grant
- Patent Title: Replaceable upper chamber parts of plasma processing apparatus
- Patent Title (中): 等离子处理装置的可更换的上室部件
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Application No.: US12879351Application Date: 2010-09-10
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Publication No.: US09076634B2Publication Date: 2015-07-07
- Inventor: Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
- Applicant: Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Buchanan Ingersoll & Rooney PC
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.
Public/Granted literature
- US20110056626A1 REPLACEABLE UPPER CHAMBER PARTS OF PLASMA PROCESSING APPARATUS Public/Granted day:2011-03-10
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