Invention Grant
- Patent Title: Polisher, pressure plate of the polisher and method of polishing
- Patent Title (中): 抛光机，抛光机的压板和抛光方法
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Application No.: US13124875Application Date: 2009-10-21
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Publication No.: US09073171B2Publication Date: 2015-07-07
- Inventor: Hong Gil Kim , Pan Gi Min
- Applicant: Hong Gil Kim , Pan Gi Min
- Applicant Address: KR Gumi, Gyeonsangbuk-Do
- Assignee: LG SILTRON INC.
- Current Assignee: LG SILTRON INC.
- Current Assignee Address: KR Gumi, Gyeonsangbuk-Do
- Agency: Ked & Associates, LLP
- Priority: KR10-2008-0103161 20081021
- International Application: PCT/KR2009/006074 WO 20091021
- International Announcement: WO2010/047520 WO 20100429
- Main IPC: B24B49/00
- IPC: B24B49/00 ; B24B37/04 ; B24B41/00
Abstract:
A polisher, a pressure plate (20) of the polisher, and a method of polishing are disclosed. The pressure plate (20) includes a main body, an air bag (50) mounted to one surface of the main body to adjust a pressure applied from the main body to a polishing object, and a pad (16b) having a ring shape, mounted along a circumference of the one surface of the main body.
Public/Granted literature
- US20110230123A1 POLISHER, PRESSURE PLATE OF THE POLISHER AND METHOD OF POLISHING Public/Granted day:2011-09-22
Information query
