Invention Grant
- Patent Title: Cathode material structure and method for preparing the same
- Patent Title (中): 阴极材料结构及其制备方法
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Application No.: US13046781Application Date: 2011-03-14
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Publication No.: US09054376B2Publication Date: 2015-06-09
- Inventor: Tsung-Hsiung Wang , Jing-Pin Pan , Chung-Liang Chang , Yu-Ling Lin
- Applicant: Tsung-Hsiung Wang , Jing-Pin Pan , Chung-Liang Chang , Yu-Ling Lin
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW99144821A 20101220
- Main IPC: H01M4/88
- IPC: H01M4/88 ; H01M4/36 ; H01M4/131 ; H01M4/1391 ; H01M4/485 ; H01M4/505 ; H01M4/525 ; H01M4/58 ; H01M4/62
Abstract:
A cathode material structure and a method for preparing the same are described. The cathode material structure includes a material body and a composite film coated thereon. The material body has a particle size of 0.1-50 μm. The composite film has a porous structure and electrical conductivity.
Public/Granted literature
- US20120153231A1 CATHODE MATERIAL STRUCTURE AND METHOD FOR PREPARING THE SAME Public/Granted day:2012-06-21
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