Invention Grant
US09054181B2 Semiconductor device, integrated circuit and method of manufacturing a semiconductor device 有权
半导体器件,集成电路及制造半导体器件的方法

Semiconductor device, integrated circuit and method of manufacturing a semiconductor device
Abstract:
A semiconductor device includes a transistor. The transistor includes a source region, a drain region, a body region, a drift zone, and a gate electrode being adjacent to the body region. The body region, the drift zone, the source region and the drain region are disposed in a first semiconductor layer having a first main surface. The body region and the drift zone are disposed along a first direction between the source region and the drain region, the first direction being parallel to the first main surface. The transistor further includes a drift control region arranged adjacent to the drift zone, the drift control region being disposed over the first main surface.
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