Invention Grant
US09054095B2 Semiconductor device and method of forming WLP with semiconductor die embedded within penetrable encapsulant between TSV interposers
有权
半导体器件和半导体晶片的WLP的形成方法,其嵌入在TSV插入物之间的可穿透密封剂内
- Patent Title: Semiconductor device and method of forming WLP with semiconductor die embedded within penetrable encapsulant between TSV interposers
- Patent Title (中): 半导体器件和半导体晶片的WLP的形成方法,其嵌入在TSV插入物之间的可穿透密封剂内
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Application No.: US13284003Application Date: 2011-10-28
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Publication No.: US09054095B2Publication Date: 2015-06-09
- Inventor: Reza A. Pagaila
- Applicant: Reza A. Pagaila
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates , P.C.
- Agent Robert D. Atkins
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/48 ; H01L23/498 ; H01L23/538 ; H01L21/56 ; H01L25/03 ; H01L25/10 ; H01L25/00 ; H01L23/00 ; H01L25/065

Abstract:
A semiconductor device has a first substrate with a plurality of first conductive vias formed partially through the first substrate. A first semiconductor die is mounted over the first substrate and electrically connected to the first conductive vias. A plurality of bumps is formed over the first substrate. A second substrate has a plurality of second conductive vias formed partially through the second substrate. A penetrable encapsulant is deposited over the second substrate. The second substrate is mounted over the first substrate to embed the first semiconductor die and interconnect structure in the penetrable encapsulant. The encapsulant can be injected between the first and second substrates. A portion of the first substrate is removed to expose the first conductive vias. A portion of the second substrate is removed to expose the second conductive vias. A second semiconductor die is mounted over the second substrate.
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