Invention Grant
- Patent Title: Methods of preparing graphene and device including graphene
- Patent Title (中): 制备石墨烯的方法和包括石墨烯的装置
-
Application No.: US13917786Application Date: 2013-06-14
-
Publication No.: US09053932B2Publication Date: 2015-06-09
- Inventor: Dong Wook Lee , Hyeon-jin Shin , Seong-jun Park , Kyung-eun Byun , David Seo , Hyun-jae Song , Yun-sung Woo , Jae-ho Lee , Hyun-jong Chung , Jin-seong Heo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2012-0132603 20121121
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36 ; C01B31/04 ; H01L21/02 ; H01L29/16
Abstract:
A method of preparing graphene includes forming a silicon carbide thin film on a substrate, forming a metal thin film on the silicon carbide thin film, and forming a metal composite layer and graphene on the substrate by heating the silicon carbide thin film and the metal thin film.
Public/Granted literature
- US20140141600A1 METHODS OF PREPARING GRAPHENE AND DEVICE INCLUDING GRAPHENE Public/Granted day:2014-05-22
Information query
IPC分类:
