Invention Grant
- Patent Title: Manufacturing method of silicon carbide single crystal
- Patent Title (中): 碳化硅单晶的制造方法
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Application No.: US13305019Application Date: 2011-11-28
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Publication No.: US09051663B2Publication Date: 2015-06-09
- Inventor: Yasushi Urakami , Ayumu Adachi , Itaru Gunjishima
- Applicant: Yasushi Urakami , Ayumu Adachi , Itaru Gunjishima
- Applicant Address: JP Kariya JP Toyota
- Assignee: DENSO CORPORATION,TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: DENSO CORPORATION,TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Kariya JP Toyota
- Agency: Posz Law Group, PLC
- Priority: JP2010-265805 20101129
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B29/36 ; C30B23/02 ; H01L29/16

Abstract:
A manufacturing method of a SiC single crystal includes a first growth process and a re-growth process. In the first growth process, a first seed crystal made of SiC is used to grow a first SiC single crystal. In the re-growth process, a plurality of growth steps is performed for (n−1) times. In a k-th growth step, a k-th seed crystal is cut out from a grown (k−1)-th SiC single crystal, and the k-th seed crystal is used to grow a k-th SiC single crystal (n≧2 and 2≦k≦n). When an offset angle of a growth surface of the k-th seed crystal is defined as θk, at least in one of the plurality of growth steps, the offset angle θk is smaller than the offset angle θk-1.
Public/Granted literature
- US20120132132A1 MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL Public/Granted day:2012-05-31
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