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US09048116B2 Semiconductor device having isolation trenches 有权
半导体器件具有隔离沟槽

Semiconductor device having isolation trenches
Abstract:
A semiconductor uses an isolation trench, and one or more additional trenches to those required for isolation are provided. These additional trenches can be connected between a transistor gate and the drain to provide additional gate-drain capacitance, or else they can be used to form series impedance coupled to the transistor gate. These measures can be used separately or in combination to reduce the switching speed and thereby reduce current spikes.
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