Invention Grant
- Patent Title: Semiconductor device having isolation trenches
- Patent Title (中): 半导体器件具有隔离沟槽
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Application No.: US13682792Application Date: 2012-11-21
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Publication No.: US09048116B2Publication Date: 2015-06-02
- Inventor: Phil Rutter , Ian Culshaw , Steven Thomas Peake
- Applicant: NXP B. V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP11192471 20111207
- Main IPC: H01L27/105
- IPC: H01L27/105 ; H01L27/088 ; H01L29/78 ; H01L29/40 ; H01L29/739 ; H01L29/06 ; H01L29/423 ; H01L29/417

Abstract:
A semiconductor uses an isolation trench, and one or more additional trenches to those required for isolation are provided. These additional trenches can be connected between a transistor gate and the drain to provide additional gate-drain capacitance, or else they can be used to form series impedance coupled to the transistor gate. These measures can be used separately or in combination to reduce the switching speed and thereby reduce current spikes.
Public/Granted literature
- US20130146972A1 SEMICONDUCTOR DEVICE HAVING ISOLATION TRENCHES Public/Granted day:2013-06-13
Information query
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