Invention Grant
US09046764B2 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
有权
抗蚀剂下层膜组合物，抗蚀剂下层膜用聚合物的制造方法和使用抗蚀剂下层膜组合物的图案化工序
- Patent Title: Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
- Patent Title (中): 抗蚀剂下层膜组合物，抗蚀剂下层膜用聚合物的制造方法和使用抗蚀剂下层膜组合物的图案化工序
-
Application No.: US13712627Application Date: 2012-12-12
-
Publication No.: US09046764B2Publication Date: 2015-06-02
- Inventor: Seiichiro Tachibana , Daisuke Kori , Tsutomu Ogihara , Kazumi Noda , Takeshi Kinsho
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-000243 20120104
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/11 ; G03F7/40 ; G03F7/004 ; G03F7/075
Abstract:
A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of a condensed body, the body being obtained by condensation of one or more kinds of a compound shown by the following general formula (1-1) with one or more kinds of a compound shown by the following general formula (2-3) and an equivalent body thereof, with one or more kinds of a compound shown by the following general formula (2-1), a compound shown by the following general formula (2-2), and an equivalent body thereof; a method for producing a polymer for a resist underlayer film; and a patterning process using the same.
Public/Granted literature
Information query
IPC分类:
