Invention Grant
US09046545B2 Semiconductor device using a silicon wafer with a pattern arrangement
有权
使用具有图案布置的硅晶片的半导体器件
- Patent Title: Semiconductor device using a silicon wafer with a pattern arrangement
- Patent Title (中): 使用具有图案布置的硅晶片的半导体器件
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Application No.: US12963862Application Date: 2010-12-09
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Publication No.: US09046545B2Publication Date: 2015-06-02
- Inventor: Tatsuro Takagaki
- Applicant: Tatsuro Takagaki
- Applicant Address: JP Tokyo
- Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2009-280128 20091210; JP2010-245914 20101102; JP2010-271618 20101206
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/00 ; B65G47/90 ; G01P15/08 ; H01L41/332 ; H01L23/544 ; B81C1/00 ; G01P15/12 ; G01P15/125 ; G01P15/18

Abstract:
A semiconductor device comprising: a support part; a flexible part, one end of which is supported by the support part; a spindle part supported by the other end of the flexible part; a displacement detection means which detects displacement of the spindle part; and an aperture part arranged adjacent to the spindle part; wherein a plurality of patterns comprised from the aperture part is formed on a silicon wafer parallel to a first direction and a second direction which intersects the first direction, the plurality of patterns include one or more patterns arranged in a straight line in the first direction and the second direction, the plurality of patterns is arranged so that an axis in which a cleavage plane of the silicon wafer and a surface arranged with the pattern on the silicon wafer intersect, and the first direction are different.
Public/Granted literature
- US20110140214A1 PATTERN ARRANGEMENT METHOD, SILICON WAFER AND SEMICONDUCTOR DEVICE Public/Granted day:2011-06-16
Information query
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