Invention Grant
- Patent Title: Semiconductor memory device
- Patent Title (中): 半导体存储器件
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Application No.: US13963710Application Date: 2013-08-09
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Publication No.: US09035402B2Publication Date: 2015-05-19
- Inventor: Yoshiaki Asao , Hideaki Harakawa
- Applicant: Yoshiaki Asao , Hideaki Harakawa
- Agency: Holtz Holtz Goodman & Chick PC
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L27/22 ; G11C11/16

Abstract:
According to one embodiment, a semiconductor memory device comprises a cell transistor includes a first gate electrode buried in a semiconductor substrate and a first diffusion layer and a second diffusion layer formed to sandwich the first gate electrode, a first lower electrode formed on the first diffusion layer, a magnetoresistive element formed on the first lower electrode to store data according to a change in a magnetization state and connected to a bit line located above, a second lower electrode formed on the second diffusion layer, and a first contact formed on the second lower electrode and connected to a source line located above. A contact area between the second lower electrode and the second diffusion layer is larger than a contact area between the first contact and the second lower electrode.
Public/Granted literature
- US20140284533A1 SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2014-09-25
Information query
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