Invention Grant
US09034556B2 Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
有权
化合物及其制造方法，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
- Patent Title (中): 化合物及其制造方法，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US12338661Application Date: 2008-12-18
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Publication No.: US09034556B2Publication Date: 2015-05-19
- Inventor: Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
- Applicant: Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2007-330891 20071221; JP2007-331163 20071221; JP2008-056880 20080306
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C303/32 ; C07C309/06 ; C07C309/12 ; C07C309/19 ; C07C381/12 ; C07C309/17 ; C07D333/46 ; C07D493/18 ; G03F7/038 ; G03F7/039 ; C08K5/19 ; C08K5/42
Abstract:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
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