Invention Grant
- Patent Title: Method for manufacturing piezoelectric film
- Patent Title (中): 制造压电薄膜的方法
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Application No.: US13037600Application Date: 2011-03-01
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Publication No.: US09034418B2Publication Date: 2015-05-19
- Inventor: Yasuaki Hamada
- Applicant: Yasuaki Hamada
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2010-045973 20100302; JP2011-014618 20110126
- Main IPC: B05D5/12
- IPC: B05D5/12 ; B41J2/14 ; H01L41/187 ; B05D3/00 ; C23C18/12 ; B05D3/02 ; C04B35/26 ; H01L41/318
Abstract:
A method for manufacturing a piezoelectric film includes: forming a piezoelectric precursor film including Bi, Fe, Mn, Ba, and Ti; and obtaining a piezoelectric film preferentially oriented with the (110) plane by crystallizing the piezoelectric precursor film.
Public/Granted literature
- US20110217454A1 METHOD FOR MANUFACTURING PIEZOELECTRIC FILM Public/Granted day:2011-09-08
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