Invention Grant
- Patent Title: Interferometry for lateral metrology
- Patent Title (中): 侧向测量干涉测量
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Application No.: US12540709Application Date: 2009-08-13
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Publication No.: US09025162B2Publication Date: 2015-05-05
- Inventor: Xavier Colonna de Lega , Robert Stoner , Peter de Groot
- Applicant: Xavier Colonna de Lega , Robert Stoner , Peter de Groot
- Applicant Address: US CT Middlefield
- Assignee: Zygo Corporation
- Current Assignee: Zygo Corporation
- Current Assignee Address: US CT Middlefield
- Agency: Fish & Richardson P.C.
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.
Public/Granted literature
- US20090303493A1 INTERFEROMETRY FOR LATERAL METROLOGY Public/Granted day:2009-12-10
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